IHP SG13CMOS5L

Overview

ihp-sg13cmos5l is IHP’s reduced CMOS-only process derived from SG13G2: no HBT module, and a 4-metal (M1-M4 + TopMetal1) back-end instead of the full M1-M5 + TopMetal1-2 stack. It’s declared as a genuine derived PDK (extends: ../ihp-sg13g2/pdk.yml, see PDK authoring guide) — layer numbering is identical between the two processes, so most decks are reused verbatim, and only the handful that actually differ have their own local files under pdks/ihp-sg13cmos5l/decks/.

Ships the same five suites as SG13G2 (main, core, precheck, density, antenna), scoped to the CMOS5L deck list.

Differences from SG13G2

  • No HBT module and no MIM capacitors — the npn, sdiod, nmosi, nbulay, nbulayblock and mim decks don’t exist for this process (their layers are forbidden, see below), so there is nothing for them to check.

  • A 4-metal stack: no Metal5, via4, topvia2, topmetal2 decks.

  • TopVia1 lands directly on Metal4 (there’s no Metal5 underneath it as there is in SG13G2) — TV1.c encloses TopVia1 in Metal4 at 0.10 µm instead of Metal5.

  • Bond pads and the passivation opening are enclosed by TopMetal1, the process’s top metal, instead of TopMetal2 — Pad.i uses a DfpadNoTopMetal1 virtual layer; Padb.c/Padc.c enclose in TopMetal1. Values are unchanged from SG13G2.

  • The antenna connect graph ends at TopVia1↔Metal4/TopMetal1 (one fewer metal level than SG13G2’s chain) — the first five connect steps are identical, so net-prefix-derived parameters are unaffected.

  • Chapter 8 DigiBnd splitting extends slightly further than SG13G2: ``Cnt.c`` gets an explicit digital variant (Cnt.c.Digi, 0.05 µm vs. the analog 0.07 µm) and ``NW.f1`` gets a .dig variant (0.24 µm vs. 0.62 µm analog) — both via the same interacting/not_interacting DigiBnd-split pattern SG13G2 already uses for NW.c1/NW.d1/NW.e1.

Forbidden layers

The forbidden deck extends SG13G2’s own forbidden-layer list with everything the reduced process doesn’t have:

- id: forbidden
  check: forbidden
  layers: [BiWind, PEmWind, BasPoly, DeepCo, PEmPoly, EmPoly, LDMOS, PBiWind, NoDRC,
           Flash, ColWind,
           Metal5, Metal5.filler, Via4, TopMetal2, TopMetal2.filler, TopVia2,
           TRANS, nBuLay, MIM, Vmim]
  value: 0.0

Any shape at all on Metal5/Via4/TopMetal2/TopVia2 (the removed metal levels), TRANS/nBuLay (the HBT module) or MIM/Vmim (MIM capacitors) is a violation — a SG13G2 design that happens to use any of these will fail this rule outright when run under SG13CMOS5L (see Troubleshooting & FAQ). That’s expected: it means the design isn’t compatible with the restricted process, not a checker misconfiguration.

Digital (DigiBnd) rule relaxations

Inside a DigiBnd region (a digital-block boundary marker), several HV-device (ThickGateOx) well-enclosure and well-spacing rules relax to their LV values — the same mechanism SG13G2 already applies to NW.c1/NW.d1/NW.e1, extended here to Cnt.c and NW.f1:

Rule

Analog (outside DigiBnd)

Digital (.dig/.Digi, inside DigiBnd)

Cnt.c

0.07 µm

0.05 µm

NW.c1

0.62 µm

0.31 µm

NW.d1

0.62 µm

0.31 µm

NW.e1

0.62 µm

0.24 µm

NW.f1

0.62 µm

0.24 µm

Each split is implemented as a pair of interacting/not_interacting virtual layers against DigiBnd (see Virtual layer operations), so the strict and relaxed variants run on disjoint geometry — a shape can only ever be measured by one of the two.

Deck and rule coverage

Decks reused, byte-for-byte identical to SG13G2 (same rule ids, values and layers): offgrid, pin, lbe, activ, tgo, gatpoly, extblock, contbar, salblock, nsdblock, psd, resistor, pwellblock, metal1metal4, via1via3, passiv, sealring, slit, lu.

Decks with local, process-specific differences (see above): forbidden, pad, cont, nwell, topvia1, topmetal1, antenna.

Not present (the underlying layers/devices don’t exist in this process): nmosi, npn, sdiod, nbulay, nbulayblock, metal5, via4, topvia2, topmetal2, mim.