IHP SG13CMOS5L¶
Overview¶
ihp-sg13cmos5l is IHP’s reduced CMOS-only process derived from SG13G2: no HBT
module, and a 4-metal (M1-M4 + TopMetal1) back-end instead of the full M1-M5 +
TopMetal1-2 stack. It’s declared as a genuine derived PDK (extends:
../ihp-sg13g2/pdk.yml, see PDK authoring guide) — layer numbering is identical
between the two processes, so most decks are reused verbatim, and only the handful that
actually differ have their own local files under pdks/ihp-sg13cmos5l/decks/.
Ships the same five suites as SG13G2 (main, core, precheck, density,
antenna), scoped to the CMOS5L deck list.
Differences from SG13G2¶
No HBT module and no MIM capacitors — the
npn,sdiod,nmosi,nbulay,nbulayblockandmimdecks don’t exist for this process (their layers are forbidden, see below), so there is nothing for them to check.A 4-metal stack: no
Metal5,via4,topvia2,topmetal2decks.TopVia1lands directly on Metal4 (there’s no Metal5 underneath it as there is in SG13G2) —TV1.cenclosesTopVia1in Metal4 at 0.10 µm instead of Metal5.Bond pads and the passivation opening are enclosed by TopMetal1, the process’s top metal, instead of TopMetal2 —
Pad.iuses aDfpadNoTopMetal1virtual layer;Padb.c/Padc.cenclose in TopMetal1. Values are unchanged from SG13G2.The antenna connect graph ends at TopVia1↔Metal4/TopMetal1 (one fewer metal level than SG13G2’s chain) — the first five connect steps are identical, so net-prefix-derived parameters are unaffected.
Chapter 8
DigiBndsplitting extends slightly further than SG13G2: ``Cnt.c`` gets an explicit digital variant (Cnt.c.Digi, 0.05 µm vs. the analog 0.07 µm) and ``NW.f1`` gets a.digvariant (0.24 µm vs. 0.62 µm analog) — both via the sameinteracting/not_interactingDigiBnd-split pattern SG13G2 already uses forNW.c1/NW.d1/NW.e1.
Forbidden layers¶
The forbidden deck extends SG13G2’s own forbidden-layer list with everything the
reduced process doesn’t have:
- id: forbidden
check: forbidden
layers: [BiWind, PEmWind, BasPoly, DeepCo, PEmPoly, EmPoly, LDMOS, PBiWind, NoDRC,
Flash, ColWind,
Metal5, Metal5.filler, Via4, TopMetal2, TopMetal2.filler, TopVia2,
TRANS, nBuLay, MIM, Vmim]
value: 0.0
Any shape at all on Metal5/Via4/TopMetal2/TopVia2 (the removed metal
levels), TRANS/nBuLay (the HBT module) or MIM/Vmim (MIM capacitors) is a
violation — a SG13G2 design that happens to use any of these will fail this rule
outright when run under SG13CMOS5L (see Troubleshooting & FAQ). That’s expected: it means the
design isn’t compatible with the restricted process, not a checker misconfiguration.
Digital (DigiBnd) rule relaxations¶
Inside a DigiBnd region (a digital-block boundary marker), several HV-device
(ThickGateOx) well-enclosure and well-spacing rules relax to their LV values — the
same mechanism SG13G2 already applies to NW.c1/NW.d1/NW.e1, extended here to
Cnt.c and NW.f1:
Rule |
Analog (outside DigiBnd) |
Digital ( |
|---|---|---|
|
0.07 µm |
0.05 µm |
|
0.62 µm |
0.31 µm |
|
0.62 µm |
0.31 µm |
|
0.62 µm |
0.24 µm |
|
0.62 µm |
0.24 µm |
Each split is implemented as a pair of interacting/not_interacting virtual
layers against DigiBnd (see Virtual layer operations), so the strict and relaxed
variants run on disjoint geometry — a shape can only ever be measured by one of the two.
Deck and rule coverage¶
Decks reused, byte-for-byte identical to SG13G2 (same rule ids, values and layers):
offgrid, pin, lbe, activ, tgo, gatpoly, extblock,
contbar, salblock, nsdblock, psd, resistor, pwellblock,
metal1–metal4, via1–via3, passiv, sealring, slit, lu.
Decks with local, process-specific differences (see above):
forbidden, pad, cont, nwell, topvia1, topmetal1, antenna.
Not present (the underlying layers/devices don’t exist in this process): nmosi,
npn, sdiod, nbulay, nbulayblock, metal5, via4, topvia2,
topmetal2, mim.